Obducat receives International Research award
The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.
-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.
The presentation of Obducat and the company´s business as a market leader in NIL equipment concludes:
“Obducat holds the distinction of being the first company to successfully develop a NIL-based high volume production solution (Sindre™) for the lithography requirements of future semiconductor devices and nanotechnology, a feat that is underpinned by the company´s exceptional research and development effort. Frost & Sullivan is pleased to present Obducat AB with the European Award for Excellence in Research”.
-When Sindre™, the world´s first high volume manufacturing system based on NIL, was launched in Malmö last January it was very well received, says Patrik Lundström.
-We are very pleased that the respected and well known institute Frost & Sullivan share our view that this HVM system has a significant commercial potential.
In the presentation of Obducat as winner of the award, Frost & Sullivan give the following background:
“In general, it is important to understand that NIL technology provides a cost-effective solution to the lithography challenges of future semiconductor nodes and many other applications. In addition, NIL stands out among other next generation lithography techniques, in terms of throughput capability and ease of implementation.
The introduction of NIL technology would be truly revolutionary and set industry standards to the new lithography approach.”
»Read the full Frost & Sullivan presentation
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