Obducat hereby announces:
The Obducat Prize™ 2008-2009
The Obducat Prize™ is awarded to the most innovative proposed development of an industrial application based on Nano Imprint Lithography.
The winner of Obducat Prize™ 2007 was Wei Hu, Robert J. Wilson, AiLeen Koh, Aihua Fu, Anthony Z. Faranesh, Christopher M. Earhart, Sebastian J. Osterfeld, Shu-Jen Han, Liang Xu, Samira Guccione, Robert Sinclair, and Shan X Wang at Stanford University, USA
“Runner-up” was Zhijun Hu and Alain M. Jonas at the Research Center on Micro- and Nanoscopic Materials and Electronic Devices at the Université catholique de Louvain, Belgium
 More information regarding the 2007 Obducat Prize™
Background:
In order to foster the development of Nano Imprint Lithography and its application in a wide spectrum of industries, Obducat introduced this scholarship.
Nanoimprint lithography is an advanced technique allowing rapid mass fabrication of nanostructures on a surface, usually a polymeric layer on top of a solid substrate, by imprinting a predefined stamp structure into that surface layer. This technology has been identified and included in the ITRS roadmap as a top contender to become the next generation industrial lithography technique.
As the world leading supplier of nanoimprint based lithography solutions, Obducat supplies the growing nanobusiness market as well as the university and institute customers with highly innovative nanoimprint lithography tools & technology, to be used in various application areas. Obducat also pursue R&D work together with various customers and universities developing cutting edge technology beneficial to nanoimprint lithography.
Type of award:
Individual. However a group of people may apply and will then share the prize in case of being selected.
Pre-requisites:
Applications from the academia as well as industry are welcome describing and proposing an innovation. For an innovation to be considered for the prize, the existence of a demonstrator showing a functional device or prototype of the proposed innovation is a requirement. Further, the use of a nanoimprint technology should be vital for the fabrication of the demonstrator as well as being beneficial for the further possible industrial exploration of the innovation. The innovation should have been made public during January 2008 through December 2009.
How to apply:
The application that clearly describes the proposed innovation, the demonstrator and the industrial aspects should be sent to:
“The Obducat Prize”
Obducat AB
Box 580
201 25 Malmo
Sweden
or emailed to: info@obducat.com subject “The Obducat Prize”.
Application to be received at Obducat not later than 5 pm (CET) Tuesday November 30, 2010. Any questions related to the application to “The Obducat Prize™” should be sent to info@obducat.com
Prizes:
First prize: € 4000 + Award Diploma.
Second prize: € 1000 + Award Diploma.
Award selection committee:
Lars Montelius, Professor in Nanotechnology, Nanometer Structure Consortium & Division of Solid State Physics, Lund University
Henri Bergstrand, Chairman of the Board of Obducat
Patrik Lundström, CEO, Obducat AB
Additional award selection committee members may be appointed.
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