Obducat receives International Research award

 

 

 

The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.

 

-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.

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A stronger company management group

 

During the last few months Obducat has strengthened the company management group with three new members: 
 

Ulf G Andersson

Vice President Business Development

 

Niclas Lundin

Chief Financial Officer (CFO)

 

Ian Holton

Managing Director, Obducat CamScan Ltd.

 

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Report from SEMICON West

 

 

At SEMICON West 2007 Obducat attended the event as exhibitor and winner of the TIS award. During the event Obducat introduced the new product lines Sindre™ and Eitre™.

 

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Obducat continues to drive the industrialization of NIL

 

In June Obducat received the first order of a Sindre™ 60 system which is to be used for manufacturing of LED devices at the Taiwan based LED manufacturer Epistar. The system has been successfully commissioned during August. This means that Obducat now has several NIL systems at customer sites that are being used for manufacturing of commercial components embedded in consumer electronics. A fact that puts Obducat in the lead of the NIL industrialization.

 

Patrik Lundström, CEO

 

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