Resist
Obducat has developed a number of resists, optimized to be used together with Obducat Nano Imprint Lithography Systems and for the Obducat proprietary process STU®.
STU® imprint resists are spin-coated onto the target substrates, allowing high control of initial layer thickness and homogenity which is essential for achieving thin and uniform residual layers. During the nano imprint lithography process, the structures in the stamp are replicated into the STU® imprint resists using Obducat proprietary Simultaneous Thermal and UV (STU®) technology. Different kinds of STU® imprint resists are available for different applications, different substrate materials and for different initial layer thicknesses.
Please contact sales@obducat.com for more information.
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