Obducat’s NIL technology is well adapted for PV production. Nano Imprint Lithography (NIL) enables a cost-efficient approach to enhancing the efficiency of Photovoltaic solar cells by controlled surface structuring. Two examples of controlled surface structuring are:
- Surface patterning that increase efficiency in light harvesting in solar cells, which in turn minimize reflection of sunlight.
- Patterning which improves internal reflection in thin-film solar cell, which in turn minimizes light escape in the cell, increase internal light reflection and light path in the cell.