The EITRE® systems are suitable for research and development within application areas such as solid-state lighting, micro optical and photonic components, patterned media, bio-medical and life science, lab-o-chip, MEMS/NEMS and semiconductors.
All Nano Imprint Lithography (NIL) systems are configured to perform full area imprint, using the patented SoftPress® technology. The proprietary design of the heater, embedded in the substrate chuck, provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and flexible temperature setting possibilities, makes it possible to use a wide range of imprint polymer.
|Wafer Size||Up to 3" Ø|
|Clean-room compatibility||Class 100|
|Foot print||0,5 m2|
|Computer controlled user interface||Standard|
|STU® technology license for R&D||Option|
|IPS® technology license for R&D||Option|
|Low pressure module||Option|