The EITRE® Nano Imprint Lithography (NIL) Systems offer a manual and affordable lithography solution, allowing pattern replication in the micro- and nanometer range. The embedded SoftPress® technology ensures excellent residual layer thickness control across the entire imprint area, enabling an accurate pattern transfer.
The flexibility of the systems allows for a variety of imprint processes to be used, such as hot embossing, thermal NIL, UV NIL and Obducat’s unique Simultaneous Thermal and UV (STU®) process
Full area imprint
Multiple Imprint process capability
Wide range of configuration possibilities
Sub-20nm residual layer thickness
More about the product
The EITRE® systems are suitable for research and development within application areas such as solid-state lighting, micro optical and photonic components, patterned media, bio-medical and life science, lab-o-chip, MEMS/NEMS and semiconductors.
All Nano Imprint Lithography (NIL) systems are configured to perform full area imprint, using the patented SoftPress® technology. The proprietary design of the heater, embedded in the substrate chuck, provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and flexible temperature setting possibilities, makes it possible to use a wide range of imprint polymer.