The SINDRE® Nano Imprint Lithography (NIL) systems are designed for fully automated high volume production, using Obducat's proprietary IPS®/STU® process.
Cost efficiency and contamination control is obtained through hands-off operation and a sophisticated cassette-to-cassette handling procedure. The high throughput and yield enables an unsurpassed efficient cost of ownership. The standard configuration of the systems generates a throughput of 30 wafers per hour.
|Imprint Area||2", 3", 4"|
|Clean-room compatibility||Class 100|
|Mini Environment||Class 10|
|Computer controlled user interface||Standard|