More about the product

Engineered for high reliability and low maintenance cost.

High yield and throughput performance result in more efficient total cost of ownership.

SoftPress® ensures imprint uniformity all the way to the edges of the substrate, without the need of any planarization layers.

IPS® increase stamp lifetime and eliminates the risk of substrate breakage.

Simple up– and downstream processing. No need for additional adhesive pre-coating of substrates or any complex and expensive post-process spin-on etch layers.


The SINDRE® Nano Imprint Lithography (NIL) systems are designed for fully automated high volume production, using Obducat's proprietary IPS®/STU® process. 

Cost efficiency and contamination control is obtained through hands-off operation and a sophisticated cassette-to-cassette handling procedure. The high throughput and yield enables an unsurpassed efficient cost of ownership. The standard configuration of the systems generates a throughput of 30 wafers per hour.



Product data

Imprint Area Up to 6"
Throughput 30 wph
Clean-room compatibility Class 100
Mini Environment Class 10
Substrate Handling Cassette-to-cassette
Computer controlled user interface Standard
STU® Standard
IPS® Standard