The QS 200/QS 300 WET platform is highly configurable enabling a fit to almost any customer requirements while offering a superior cost efficiency. The tools are built in the materials compatible with the respective customer processes. There are dedicated standard configurations for Photomask Cleaning, Etching, Lift-off and general substrate Cleaning.
The tools are available as stand-alone tools which can be placed next to each other to create a mini-line of processing units.
This versatile tool can also process pieces from broken or damaged wafers. Manual loading and unloading of the substrates are very easy due to the unrestricted access into the process chamber.
For safety purposes an integrated and interlocked automatic process chamber door containing a safety interrupt sensor is standard. A fully automated dry-in, dry-out robot loading is optional