Based on our patented NIL-technology, Obducat has created a process suitable for replication of extremely accurate micro- and nanosized structures from a master stamp onto a target substrate which can be anything from a flexible polymer film to a hard-sapphire substrate. Our technology also enables us to replicate patterns and structures onto non-flat substrates, such as camera lenses with concave or convex surfaces.
All our NIL-systems perform Full Area Imprint, meaning that the entire surface is replicated in one single step and not in several smaller steps which is common in many competing solutions.
In the Obducat process developed for High Volume Manufacturing purposes, the patterns are replicated from a master stamp onto a polymer film. The polymer film, which we call Intermediate Polymer Stamp (IPS®), with the patterns transferred from the master stamp is then used to replicate the patterns onto the target substrate. In this final replication onto the target substrate, we use a Simultaneous Thermal and UV (STU®) process which eliminates thermal expansions and thereby increases the quality and repeatability of the pattern transfer. The IPS®-technology reduces the wear on the master stamp and decreases the number of defects caused by particle contamination which increases the overall cost efficiency of the Obducat NIL-process approach.
Obducat’s patented technology, Soft Press®, in combination with the IPS®, enable the patterns to be transferred with an even pressure over large substrate sizes – a key element of the NIL-technology.